17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents: proceedings: 13-14 November 2000, Munich, Germany Uwe F. W. Behringer, chair/editor; organized by VDE/VDI-Society and Institute for Microstructure Technology (GMM) (Germany); published by SPIE--the International Society for Optical Engineering
Publisher: Bellingham, Washington : SPIE, c2001.
ISBN: 0819440396
Notes:
Includes bibliographical references and index.
Book Details:
Language: eng
Physical Description: x, 192 p. : ill. ; 28 cm.
15th Annual Symposium on Photomask Technology and Management
(Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering; ISBN: 0819419850;
100% match)
•
16th Annual Symposium on Photomask Technology and Management
(Gilbert V. Shelden, James A. Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; ISBN: 0819422827;
100% match)
Click on a subject to see other books listed with the same
subject or to drill down into components of the subject -- such as
geographical locations, dates and so on.
We query many merchants so that you can instantly
compare prices and
availability. You can even check historic prices and subscribe
for notifications. For a manual check, clicking on a link will open a
new window with a search for this book on the merchant's site of your
choice.
