17th Annual Symposium on Photomask Technology and Management
17th Annual Symposium on Photomask Technology and Management: [proceedings]: 17-19 September, 1997, Redwood City, California James A. Reynolds, Brian J. Grenon, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; published by SPIE--the International Society for Optical Engineering
Publisher: Bellingham, Washington : SPIE, c1998.
ISBN: 0819426695
Notes:
Includes bibliographical references and index.
Book Details:
Language: eng
Physical Description: ix, 554 p. : ill. ; 28 cm.
15th Annual Symposium on Photomask Technology and Management
(Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering; ISBN: 0819419850;
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16th Annual Symposium on Photomask Technology and Management
(Gilbert V. Shelden, James A. Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; ISBN: 0819422827;
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