16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents: 15-16 November 1999, Munich, Germany Uwe F. W. Behringer, chair/editor; organized by VDE/VDI-Society Microelectronics, Micro- and Precision Engineering (GMM) (Germany); cooperating organization, Institute for Microstructure Technology/Forschungszentrum Karlsruhe GmbH (Germany)
Publisher: Bellingham, Washington : SPIE, c2000.
ISBN: 0819436143
Notes:
At head of title: Proceedings.
Includes bibliographical references and index.
Book Details:
Language: eng
Physical Description: xii, 252 p. : ill. ; 28 cm.
15th Annual Symposium on Photomask Technology and Management
(Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering; ISBN: 0819419850;
100% match)
•
16th Annual Symposium on Photomask Technology and Management
(Gilbert V. Shelden, James A. Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; ISBN: 0819422827;
100% match)
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