16th Annual Symposium on Photomask Technology and Management
16th Annual Symposium on Photomask Technology and Management: proceedings: 18-20 September 1996, Redwood City, California Gilbert V. Shelden, James A Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology
Publisher: Bellingham, Wash. : SPIE, c1996.
ISBN: 0819422827
LCC: TA1505
15th Annual Symposium on Photomask Technology and Management
(Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering; ISBN: 0819419850;
100% match)
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19th Annual Symposium on Photomask Technology
(Frank E. Abboud, Brian J. Grenon, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; ISBN: 081943468X;
100% match)
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