11th annual Symposium on Photomask Technology
11th annual Symposium on Photomask Technology: proceedings: September 25-27, 1991, Sunnyvale, California
sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology
Publisher: Bellingham, Wash. : SPIE, c1992.
ISBN: 081940733X
DDC: 621.3815
15th Annual Symposium on Photomask Technology and Management
(Gilbert V. Sheldon, James N. Wiley, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, published by SPIE--The International society for Optical Engineering; ISBN: 0819419850;
100% match)
•
16th Annual Symposium on Photomask Technology and Management
(Gilbert V. Shelden, James A. Reynolds, chairs/editors; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology; ISBN: 0819422827;
100% match)
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